Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High temperature chemical vapor deposition chamber

High temperature chemical vapor deposition chamber

US Patent 6364954 · Granted Apr 2, 2002

Estimated economic value: $41,044,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate support for reduced damage substrate backside2024
Systems and methods for making solar panels or components thereof2024
Systems and methods for making solar panels or components thereof2024
Substrate processing chamber having heated showerhead assembly2023
Plasma processing system workpiece carrier with thermally isolated heater plate 2022
Optical fiber connecting device2021
Substrate processing system, substrate conveying device and conveying method2021
Optical fiber connecting device with a dust-proof sleeve2021
High temperature process chamber lid2020
Apparatus and method of selective turning over a row of substrates in an array o2020
Gas distribution showerhead for semiconductor processing2020
Optical fiber connecting device with a sleeve ring2020