Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Spin-rinse-drying process for electroplated semiconductor wafers

Spin-rinse-drying process for electroplated semiconductor wafers

US Patent 6290865 · Granted Sep 18, 2001

Estimated economic value: $35,381,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Histology recognition to automatically score and quantify cancer grades and indi2023
Pathology case review, analysis and prediction2020
Histology recognition to automatically score and quantify cancer grades and indi2020
Pathology case review, analysis and prediction2018
Histology recognition to automatically score and quantify cancer grades and indi2017
System and method for detecting design and process defects on a wafer using proc2017
Low-cost solar cell metallization over TCO and methods of their fabrication2017
Toll image review gamification2017
Low-cost solar cells and methods for fabricating low cost substrates for solar c2014
Method for quantitative assessment of thymus integrity2013
Coils for generating a plasma and for sputtering2013
Method and apparatus for growing thin oxide films on silicon while minimizing im2012