Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Measurement of the mobile ion concentration in the oxide layer of a semiconductor wafer

Measurement of the mobile ion concentration in the oxide layer of a semiconductor wafer

US Patent 5773989 · Granted Jun 30, 1998

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor doping characterization method using photoneutralization time cons2024
Semiconductor doping characterization method using photoneutralization time cons2024
Method for electroporation controlled by electrical impedence measurements2024
Topside contact device and method for characterization of high electron mobility2023
System and method for electroporation controlled by electrical impedance measure2022
Measuring semiconductor doping using constant surface potential corona charging2021
Non-contact method to monitor and quantify effective work function of metals2020
Systems and methods for controlling the spatial distribution of an electromagnet2018
System and method for controlling the surface charge of a region of tissue2018
Photoluminescence mapping of passivation defects for silicon photovoltaics2017
Noncontact determination of interface trap density for semiconductor-dielectric 2015
Accurate measurement of excess carrier lifetime using carrier decay method2014