Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material

Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material

US Patent 5302488 · Granted Apr 12, 1994

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus for vacuum purification2019
Top-layer membrane formation composition and method for forming resist pattern u2019
IV-catheter insertion device2019
Method for vacuum purification2018
Composition for forming overlay film, and resist pattern formation method employ2017
Composition for forming topcoat layer and resist pattern formation method employ2017
Needle free connector with a collapsible resilient membrane fitting and correspo2017
Aromatic imide compound and method for producing same2016
Aromatic imide compound and method for producing same2016
Composition for forming topcoat layer and resist pattern formation method employ2016
IV-catheter insertion device2016
Apparatus for selectively establishing a needleless injection port on IV tubing,2016