Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Reaction chamber design and method to minimize particle generation in chemical vapor deposition reactors

Reaction chamber design and method to minimize particle generation in chemical vapor deposition reactors

US Patent 5200232 · Granted Apr 6, 1993

Estimated economic value: $4,860,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor processing chamber with dual-lift mechanism for edge ring elevatio2025
Plasma processing devices having multi-port valve assemblies2024
Apparatus for spatial and temporal control of temperature on a substrate2022
Chamber with vertical support stem for symmetric conductance and RF delivery2020
Apparatus for spatial and temporal control of temperature on a substrate2020
Chamber with vertical support stem for symmetric conductance and RF delivery2019
Chamber with vertical support stem for symmetric conductance and RF delivery2018
Plasma processing devices having multi-port valve assemblies2018
Floating collar clamping device for auto-aligning nut and screw in linear motion2015
Methods of and apparatuses for measuring electrical parameters of a plasma proce2015
Plasma processing systems with mechanisms for controlling temperatures of compon2014
Apparatus for spatial and temporal control of temperature on a substrate2014