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Home › Process for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposure

Process for the production of photoresist relief structures having an overhang character using o-quinone diazide photoresist with overexposure

US Patent 4649101 · Granted Mar 10, 1987

Estimated economic value: $105,677,000 ⓘ

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