Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Dry etching of copper patterns

Dry etching of copper patterns

US Patent 4352716 · Granted Oct 5, 1982

Estimated economic value: $30,358,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

CMOS transistor with two-layer inverse-T tungsten gate1997
Method for fabricating a MOS transistor with two-layer inverse-T tungsten gate s1997
Structure and fabrication of SiCr microfuses1994
SiCr microfuses1994
Chem-mech polishing method for producing coplanar metal/insulator films on a sub1990
Trench etch endpoint detection by LIF1987
Composite insulator structure1986
Planar multi-level metal process with built-in etch stop1984
Method for forming conductive lines and vias1984
Method for forming planar metal/insulator structures1983
Method for forming planar metal/insulator structures1983
Passivation of RIE patterned al-based alloy films by etching to remove contamina1983