Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Spatially tunable deposition to compensate within wafer differential bow

Spatially tunable deposition to compensate within wafer differential bow

US Patent 12338531 · Granted Jun 24, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Bidirectional indexing apparatus2025
Bidirectional indexing apparatus2025
Substrate pedestal including backside gas-delivery tube2025
Carrier ring designs for controlling deposition on wafer bevel/edge2025
Alpha-herpesvirus insensitive monoclonal cell strain, and preparation method the2025
UV cure for local stress modulation2025
Friction stir welding in semiconductor manufacturing applications2025
Cooling of air actuated valve using actuating air2025
Cooling of air actuated valve using actuating air2025
Use of vacuum during transfer of substrates2025
Distance measurement between gas distribution device and substrate support at hi2024
Remote-plasma clean (RPC) directional-flow device2024