Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Remote-plasma clean (RPC) directional-flow device

Remote-plasma clean (RPC) directional-flow device

US Patent 12013682 · Granted Jun 18, 2024

Estimated economic value: $233,164,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Dynamic sheath control with edge ring lift2025
Carrier ring designs for controlling deposition on wafer bevel/edge2025
Spatially tunable deposition to compensate within wafer differential bow2025
Spatially tunable deposition to compensate within wafer differential bow2024
Carrier ring designs for controlling deposition on wafer bevel/edge2023
Carrier ring designs for controlling deposition on wafer bevel/edge2023
Remote-plasma clean (RPC) directional-flow device2023
Remote-plasma clean (RPC) directional-flow device2023
Dynamic sheath control with edge ring lift2022
Method and apparatuses for reducing porogen accumulation from a UV-cure chamber2021
Lift pin assembly and associated methods2019
Clean resistant windows for ultraviolet thermal processing2019