Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Oxidative conversion in atomic layer deposition processes

Oxidative conversion in atomic layer deposition processes

US Patent 12087574 · Granted Sep 10, 2024

Estimated economic value: $144,237,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Showerhead for a substrate processing system2025
Plasma enhanced atomic layer deposition of silicon-containing films2025
Plasma enhanced atomic layer deposition of silicon-containing films2025
Modulated atomic layer deposition2025
In-situ control of film properties during atomic layer deposition2025
In-situ control of film properties during atomic layer deposition2025
Reducing intralevel capacitance in semiconductor devices2025
Reducing intralevel capacitance in semiconductor devices2025
Reducing intralevel capacitance in semiconductor devices2025
Impurity reduction in silicon-containing films2025
Impurity reduction in silicon-containing films2025
Apparatuses for uniform fluid delivery in a multi-station semiconductor processi2025