Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic

Two-color self-aligned double patterning (SADP) to yield static random access memory (SRAM) and dense logic

US Patent 11978639 · Granted May 7, 2024

Estimated economic value: $11,969,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Stacked vertical transport field effect transistor with anchors2025
Double patterned microcooler having alternating fin widths2025
Patterning magnetic tunnel junctions and the like while reducing detrimental res2025
Circuit interconnect structure2025
Stressed material within gate cut region2025
Air gap spacer for metal gates2025
Methods for preparing small features on a substrate2025
Multilayer dielectric stack for damascene top-via integration2025
Two-color self-aligned double patterning (SADP) to yield static random access me2025
Two-color self-aligned double patterning (SADP) to yield static random access me2025
Two-color self-aligned double patterning (SADP) to yield static random access me2025
Two-color self-aligned double patterning (SADP) to yield static random access me2025