{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Methods of forming metal nitride films", "item": "https://www.patentleaderboard.com/patent/11978625"}]}
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Methods of forming metal nitride films

US Patent 11978625 · Granted May 7, 2024

Estimated economic value: $105,661,000 ⓘ

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