Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material

Method and apparatus for forming a patterned layer of carbon, method of forming a patterned layer of material

US Patent 11807937 · Granted Nov 7, 2023

Estimated economic value: $90,276,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate support and substrate table2025
Method and apparatus for forming a patterned layer of material2025
Method and apparatus for forming a patterned layer of material2025
Substrate holder, lithographic apparatus, device manufacturing method, and metho2025
Substrate holder and method of manufacturing a substrate holder2025
Method of manufacturing a substrate support for a lithographic apparatus, substr2025
Substrate support, lithographic apparatus, method for manipulating charge distri2025
Method for preparing a substrate and lithographic apparatus2025
Lithographic apparatus and method2025
Breath analyzer, ventilator, and method for breath analysis2024
Lithographic apparatus and a method of operating the apparatus2024
Substrate holder, lithographic apparatus, device manufacturing method, and metho2024