Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for controlling a plasma process

Method for controlling a plasma process

US Patent 11447868 · Granted Sep 20, 2022

Estimated economic value: $25,949,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for digital control of ion energy distribution in a plasma2025
Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Method for forming integrated circuit structures2025
Methods and apparatus for processing a substrate2025
Radio-frequency (RF) matching network for fast impedance tuning2025
Wafer to baseplate arc prevention using textured dielectric2025
Inductively coupled plasma source with radial coil network2025
Auxiliary plasma source for robust ignition and restrikes in a plasma chamber2025
Adjustable de-chucking voltage2025
Method for optimizing low-band-low-band carrier-aggregation transmit and receive2025
Flexible display apparatus and method for manufacturing the same2025
Print control device2025