Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Structure including SiOC layer and method of forming same

Structure including SiOC layer and method of forming same

US Patent 11114294 · Granted Sep 7, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and apparatus for cleaning a vessel2025
Apparatus for providing a gas mixture to a reaction chamber and method of using 2025
Semiconductor processing device2025
Semiconductor processing device2025
Showerhead assembly and components2025
Methods and systems for forming a layer comprising vanadium and nitrogen2025
Multiple-layer method and system for forming material within a gap2025
Showerhead assembly and components thereof2025
Manifolds for uniform vapor deposition2025
Substrate susceptor using edge purging2025
Methods and systems for filling a gap2025
Methods and systems for forming doped silicon nitride films2025