Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus

Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatus

US Patent 11029614 · Granted Jun 8, 2021

Estimated economic value: $44,613,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Computational metrology2025
Computational metrology2025
Methods and patterning devices and apparatuses for measuring focus performance o2025
Substrate level sensing in a lithographic apparatus2025
Method for determining defectiveness of pattern based on after development image2025
Method in the manufacturing process of a device, a non-transitory computer-reada2025
Method for controlling a lithographic apparatus and associated apparatuses2025
Selection of measurement locations for patterning processes2025
Method for determining a measurement recipe and associated apparatuses2025
Method of determining control parameters of a device manufacturing process2025
Method of determining control parameters of a device manufacturing process2025
Computational metrology2025