Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor processing systems having multiple plasma configurations

Semiconductor processing systems having multiple plasma configurations

US Patent 11024486 · Granted Jun 1, 2021

Estimated economic value: $74,932,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Brake mechanism for a radial piston unit2025
Extreme uniformity heated substrate support assembly2025
Ion extraction optics having non uniform grid assembly2025
System architecture of manufacturing of semiconductor wafers2025
Semiconductor processing chamber for improved precursor flow2025
Cylindrical cavity with impedance shifting by irises in a power-supplying wavegu2025
Wafer transfer device and wafer transfer method2025
Batch curing chamber with gas distribution and individual pumping2025
Metal oxide resist patterning with electrical field guided post-exposure bake2025
Chamber and methods of treating a substrate after exposure to radiation2024
Flow control features of CVD chambers2024
Flow control features of CVD chambers2024