Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group

Assignee

• Nissan Chemical Industries

Inventors

• Wataru SHIBAYAMA (32 patents)
• Kenji Takase (33 patents)
• Makoto Nakajima (100 patents)
• Satoshi Takeda (76 patents)
• Hiroyuki Wakayama (28 patents)
• Rikimaru Sakamoto (101 patents)

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