Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Enhanced etching processes using remote plasma sources

Enhanced etching processes using remote plasma sources

US Patent 10424485 · Granted Sep 24, 2019

Estimated economic value: $43,471,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Brake mechanism for a radial piston unit2025
Self-aligned wide backside power rail contacts to multiple transistor sources2025
Extreme uniformity heated substrate support assembly2025
Selective etching between silicon-and-germanium-containing materials with varyin2025
Semiconductor chamber components with advanced dual layer nickel-containing coat2025
Ion extraction optics having non uniform grid assembly2025
Selective etching of silicon-and-germanium-containing materials with increased s2025
Low temperature graphene growth2025
System architecture of manufacturing of semiconductor wafers2025
Multi color stack for self aligned dual pattern formation for multi purpose devi2025
Semiconductor processing chamber for improved precursor flow2025
Methods for removing etch stop layers2025