Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Process window widening using coated parts in plasma etch processes

Process window widening using coated parts in plasma etch processes

US Patent 10297458 · Granted May 21, 2019

Estimated economic value: $30,257,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Self-aligned wide backside power rail contacts to multiple transistor sources2025
Extreme uniformity heated substrate support assembly2025
Selective etching between silicon-and-germanium-containing materials with varyin2025
Semiconductor chamber components with advanced dual layer nickel-containing coat2025
Ion extraction optics having non uniform grid assembly2025
Lattice-structured concrete three-dimensional (3D) printing methods for componen2025
Selective etching of silicon-and-germanium-containing materials with increased s2025
Low temperature graphene growth2025
System architecture of manufacturing of semiconductor wafers2025
Efficiently providing data in a cloud pipeline to geographically distributed use2025
Multi color stack for self aligned dual pattern formation for multi purpose devi2025
Semiconductor processing chamber for improved precursor flow2025