Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for optical metrology in patterned structures

Method and system for optical metrology in patterned structures

US Patent 10274435 · Granted Apr 30, 2019

Estimated economic value: $4,749,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

End-to-end measurement for semiconductor specimens2025
Optical phase measurement method and system2025
Optical phase measurement method and system2025
Machine learning based yield prediction2025
System and method for digital optical aberration correction and spectral imaging2025
System and method for optical imaging and measurement of objects2025
Combined ocd and photoreflectance method and system2025
Accurate Raman spectroscopy2025
Hybrid metrology method and system2025
Hybrid metrology method and system2025
Systems and methods for optical metrology2025
Optical metrology system and method2025