Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and apparatus for processing a substrate to remove moisture and/or residue

Methods and apparatus for processing a substrate to remove moisture and/or residue

US Patent 10247473 · Granted Apr 2, 2019

Estimated economic value: $31,503,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Spatial optical emission spectroscopy for etch uniformity2025
Estimation of chamber component conditions using substrate measurements2025
Substrate measurement subsystem2025
Chamber component condition estimation using substrate measurements2025
Integrated substrate measurement system to improve manufacturing process perform2025
Integrated substrate measurement system2024
Adjustable achromatic collimator assembly for endpoint detection systems2024
Multiple reflectometry for measuring etch parameters2024
Adjustable achromatic collimator assembly for endpoint detection systems2023
Integrated substrate measurement system to improve manufacturing process perform2023
Spatial optical emission spectroscopy for etch uniformity2023
Multiple reflectometry for measuring etch parameters2023