Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus

Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus

US Patent 10146138 · Granted Dec 4, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Projection exposure apparatus for semiconductor lithography2025
Projection objective including an optical device2025
Facet assembly for a facet mirror2025
Mirror, in particular for microlithography2025
Support for an optical element2025
Mirror, in particular for a microlithographic projection exposure apparatus2025
Method for machining a workpiece in the production of an optical element2024
Method for machining a workpiece in the production of an optical element2024
Optical arrangement and method for repairing the optical arrangement after a sho2022
Mirror, in particular for a microlithographic projection exposure system2022
Mirror, in particular for a microlithographic projection exposure system2022
Method for treating a reflective optical element for the EUV wavelength range, m2022