Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Particle removal system and method thereof

Particle removal system and method thereof

US Patent 10067418 · Granted Sep 4, 2018

Estimated economic value: $8,697,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

EUV radiation source apparatus for lithography2025
Semiconductor processing tool and methods of operation2025
Charge control system and method thereof2025
Semiconductor processing tool and methods of operation2025
Semiconductor processing tool and method of using the same2025
Lithography apparatus and method2025
Particle image velocimetry of extreme ultraviolet lithography systems2025
Semiconductor processing tool and methods of operation2025
Lithography system and methods2025
Methods of servicing photolithographic apparatus2025
Patterned organometallic photoresists and methods of patterning2025
Method and apparatus for removing contamination2025