TE

Tomoyuki Enomoto

NI Nissan Chemical Industries: 28 patents #20 of 1,150Top 2%
Honda Motor Co.: 5 patents #4,418 of 21,052Top 25%
Mitsubishi Electric: 4 patents #7,099 of 25,717Top 30%
HO Hoya: 2 patents #523 of 1,290Top 45%
BS Brewer Science: 2 patents #60 of 171Top 40%
UN Unknown: 2 patents #12,644 of 83,584Top 20%
GI Gs Yuasa International: 1 patents #283 of 491Top 60%
📍 Toyama, CA: #3 of 7 inventorsTop 45%
Overall (All Time): #75,848 of 4,157,543Top 2%
41
Patents All Time

Issued Patents All Time

Showing 26–41 of 41 patents

Patent #TitleCo-InventorsDate
8603731 Resist underlayer film forming composition for electron beam lithography Takahiro Sakaguchi, Rikimaru Sakamoto, Masaki Nagai 2013-12-10
8501393 Anti-reflective coating forming composition containing vinyl ether compound Tadashi Hatanaka, Shigeo Kimura 2013-08-06
8257908 Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative Takahiro Sakaguchi 2012-09-04
8088546 Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom Satoshi Takei, Takahiro Sakaguchi 2012-01-03
7846638 Composition for forming anti-reflective coating for use in lithography Takahiro Kishioka, Ken-ichi Mizusawa, Rikimaru Sakamoto, Keisuke Nakayama, Yasuo Kawamura 2010-12-07
7833681 Mask blank and mask Masahiro Hashimoto, Takahiro Sakaguchi, Rikimaru Sakamoto, Masaki Nagai 2010-11-16
7816067 Coating-type underlayer coating forming composition for lithography containing naphthalene resin derivative Takahiro Kishioka, Takahiro Sakaguchi 2010-10-19
7795369 Sulfur atom-containing anti-reflective coating forming composition for lithography Yoshiomi Hiroi, Keisuke Nakayama 2010-09-14
7736822 Resist underlayer coating forming composition for mask blank, mask blank and mask Masahiro Hashimoto, Takahiro Sakaguchi, Rikimaru Sakamoto, Masaki Nagai 2010-06-15
7598182 Anti-reflective coating forming composition containing polyamic acid Tadashi Hatanaka, Shigeo Kimura 2009-10-06
7425399 Composition for forming anti-reflective coating for use in lithography Takahiro Kishioka, Ken-ichi Mizusawa, Rikimaru Sakamoto, Keisuke Nakayama, Yasuo Kawamura 2008-09-16
7038328 Anti-reflective compositions comprising triazine compounds Keisuke Nakayama, Rama Puligadda 2006-05-02
6680160 Halogenated anti-reflective coatings Ken-ichi Mizusawa, Shin-Ya Arase, Rama Puligadda 2004-01-20
6632544 Aromatic amine derivative, soluble conductive compound, and electroluminscent element Junji Kido, Hiroyoshi Fukuro, Hitoshi Furusho 2003-10-14
6632545 Electroluminescent element Junji Kido, Hiroyoshi Fukuro, Hitoshi Furusho 2003-10-14
6495305 Halogenated anti-reflective coatings Ken-ichi Mizusawa, Shin-Ya Arase, Rama Puligadda 2002-12-17