Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8916327 | Underlayer coating forming composition containing dextrin ester compound | Satoshi Takei, Yasushi Sakaida | 2014-12-23 |
| 8822138 | Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring | Hirokazu Nishimaki, Yasushi Sakaida, Keisuke Hashimoto | 2014-09-02 |
| 8722841 | Carbazole novolak resin | Daigo Saito, Hiroaki Okuyama, Hideki Musashi, Keisuke Hashimoto | 2014-05-13 |
| 8709701 | Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin | Takahiro Sakaguchi, Tomoyuki Enomoto | 2014-04-29 |
| 8674052 | Carbazole novolak resin | Daigo Saito, Hiroaki Okuyama, Hideki Musashi, Keisuke Hashimoto | 2014-03-18 |
| 8481247 | Resist underlayer film forming composition containing liquid additive | Yusuke Horiguchi, Satoshi Takei | 2013-07-09 |
| 8426111 | Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating | Satoshi Takei, Motohiko Hidaka | 2013-04-23 |
| 8361694 | Resist underlayer film forming composition | Takahiro Sakaguchi | 2013-01-29 |
| 8227172 | Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing | Yusuke Horiguchi, Satoshi Takei | 2012-07-24 |
| 7687223 | Underlayer coating forming composition for lithography containing cyclodextrin compound | Satoshi Takei, Keisuke Hashimoto | 2010-03-30 |
| 7226721 | Underlayer coating forming composition for lithography containing compound having protected carboxyl group | Satoshi Takei, Takahiro Kishioka, Yasushi Sakaida | 2007-06-05 |