Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8867019 | Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method | Tatsuo Fukui | 2014-10-21 |
| 8305556 | Projection optical system, exposure apparatus, exposure method, display manufacturing method, mask, and mask manufacturing method | Tatsuo Fukui | 2012-11-06 |
| 8130364 | Projection optical apparatus, exposure method and apparatus, photomask, and device and photomask manufacturing method | Hitoshi Hatada | 2012-03-06 |
| 7372543 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus | Masashi Tanaka, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu | 2008-05-13 |
| 7372544 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus | Masashi Tanaka, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu | 2008-05-13 |
| 7023527 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus | Masashi Tanaka, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu | 2006-04-04 |
| 6795169 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus | Masashi Tanaka, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu | 2004-09-21 |
| 6556278 | Exposure/imaging apparatus and method in which imaging characteristics of a projection optical system are adjusted | Masashi Tanaka, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu | 2003-04-29 |
| 6509954 | Aperture stop having central aperture region defined by a circular ARC and peripheral region with decreased width, and exposure apparatus and method | Masashi Tanaka, Kinya Kato | 2003-01-21 |
| 6351305 | Exposure apparatus and exposure method for transferring pattern onto a substrate | Masahi Tanaka, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu | 2002-02-26 |
| 6157497 | Exposure apparatus | — | 2000-12-05 |
| 5729331 | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus | Masashi Tanaka, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu | 1998-03-17 |
| 4744662 | Apparatus for measuring dimensions of micropattern | Takeshi Suto, Tatsumi Ishizeki | 1988-05-17 |