KS

Kazuaki Suzuki

NI Nikon: 38 patents #69 of 2,493Top 3%
SO Sony: 11 patents #4,043 of 25,231Top 20%
PC Phild Co.: 9 patents #4 of 6Top 70%
Tdk: 6 patents #953 of 3,796Top 30%
DE Dexerials: 5 patents #90 of 387Top 25%
NS Nippon Steel: 4 patents #672 of 4,423Top 20%
SL Shiseido Company, Limited: 4 patents #179 of 1,112Top 20%
NK Nippon Kogaku K.K.: 4 patents #88 of 382Top 25%
HI Hitachi: 3 patents #10,712 of 28,497Top 40%
PA Panasonic: 3 patents #7,617 of 21,108Top 40%
ND Nitto Denko: 3 patents #959 of 2,479Top 40%
KT Kabushiki Kaisha Toshiba: 3 patents #8,011 of 21,451Top 40%
AK Asahi Denka Kogyo: 2 patents #36 of 196Top 20%
Sumitomo Electric Industries: 2 patents #9,741 of 21,551Top 50%
HI Hi-Lex: 1 patents #46 of 114Top 45%
EP Epistar: 1 patents #519 of 732Top 75%
FT Funai Techno-Systems: 1 patents #3 of 8Top 40%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
NN Nikon Metrology Nv: 1 patents #17 of 42Top 45%
📍 Osaka, MO: #4 of 11 inventorsTop 40%
Overall (All Time): #13,133 of 4,157,543Top 1%
105
Patents All Time

Issued Patents All Time

Showing 51–75 of 105 patents

Patent #TitleCo-InventorsDate
6585165 IC card having a mica capacitor Nobukazu Kuroda 2003-07-01
6573515 Charged-particle-beam projection-exposure apparatus and methods exhibiting improved alignment and registration of projected pattern portions 2003-06-03
6572022 Information recording tag 2003-06-03
6518887 Information recording tag Takashi Matsumura 2003-02-11
6496247 Exposure apparatus and exposure method 2002-12-17
6456363 Exposure control apparatus and method 2002-09-24
6433649 Non-reciprocal circuit element and millimeter-wave hybrid integrated circuit board with the non-reciprocal circuit element Taro Miura, Makoto Hasegawa, Takahide Kurahashi, Hidenori Ohata, Sakae Henmi 2002-08-13
6433347 Charged-particle-beam projection-exposure methods and apparatus that selectively expose desired exposure units of a reticle pattern 2002-08-13
6411364 Exposure apparatus 2002-06-25
6384898 Projection exposure apparatus Jiro Inoue 2002-05-07
6350459 Solubilized cosmetic composition with a pharmaceutical or cosmetic agent, a methacrylate copolymer and a cyclodextrin Wataru Tokue, Kenzo Ito, Shoji Nishiyama 2002-02-26
6295119 Scanning type exposure apparatus with multiple field diaphragms for providing consistent exposure 2001-09-25
6292254 Projection exposure method and apparatus 2001-09-18
RE37352 Projection optical apparatus Yukio Kakizaki, Tetsuo Taniguchi 2001-09-04
6277533 Scanning exposure method Shinji Wakamoto, Yuji Imai 2001-08-21
6268906 Exposure apparatus and exposure method 2001-07-31
6259510 Exposure method and apparatus 2001-07-10
6235221 Multilayer ceramic part Takahide Kurahashi, Hidenori Ohata 2001-05-22
6232051 Method for production of semiconductor devices 2001-05-15
6222615 Exposure control apparatus and method 2001-04-24
6218058 Charged particle beam transfer mask Takehisa Yahiro, Shin-ichi Kojima 2001-04-17
6198708 Disk driving device capable of formatting a finalized rewritable disk 2001-03-06
6120884 Conductor paste and multilayer ceramic part using the same Katsuhiko Igarashi, Hidenori Ohata, Takahide Kurahashi 2000-09-19
6118515 Scanning exposure method Shinji Wakamoto, Yuji Imai 2000-09-12
6104474 Apparatus and method for controlling scanning exposure of photosensitive substrate 2000-08-15