Issued Patents All Time
Showing 25 most recent of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835683 | Quartz glass member and projection aligner | Norio Komine, Akiko Yoshida, Seishi Fujiwara | 2004-12-28 |
| 6656860 | Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatus | Akiko Yoshida, Norio Komine | 2003-12-02 |
| 6649268 | Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member | Norio Komine, Seishi Fujiwara, Akiko Yoshida, Norihisa Yamaguchi | 2003-11-18 |
| 6587181 | Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus | Seishi Fujiwara | 2003-07-01 |
| 6587262 | UV synthetic silica glass optical member and reduction projection exposure apparatus using the same | Seishi Fujiwara, Norio Komine | 2003-07-01 |
| 6518210 | Exposure apparatus including silica glass and method for producing silica glass | Norio Komine, Hiroyuki Hiraiwa | 2003-02-11 |
| 6505484 | Forming method of silica glass and forming apparatus thereof | Seishi Fujiwara, Norio Komine | 2003-01-14 |
| 6473226 | Silica glass member | Seishi Fujiwara | 2002-10-29 |
| 6442973 | Synthetic silica glass and its manufacturing method | Norio Komine, Seishi Fujiwara, Akiko Yoshida | 2002-09-03 |
| 6438081 | Storage media reading system | Hiroyuki Yonetani | 2002-08-20 |
| 6378340 | Manufacturing method of synthetic silica glass | Seishi Fujiwara, Norio Komine | 2002-04-30 |
| 6374639 | Silica glass and its manufacturing method | Norio Komine, Seishi Fujiwara | 2002-04-23 |
| 6373554 | Optical system with improved durability for projection exposure apparatus and method for manufacturing optical system for projection exposure apparatus | Seishi Fujiwara | 2002-04-16 |
| 6339033 | Silica glass having superior durability against excimer laser beams and method for manufacturing the same | Norio Komine, Seishi Fujiwara, Akiko Yoshida | 2002-01-15 |
| 6320661 | Method for measuring transmittance of optical members for ultraviolent use, synthetic silica glass, and photolithography apparatus using the same | Akiko Yoshida, Norio Komine | 2001-11-20 |
| 6291377 | Silica glass and its manufacturing method | Norio Komine, Seishi Fujiwara | 2001-09-18 |
| 6269661 | Method for manufacturing optical components for use in the ultraviolet region | Akiko Moriya, Norio Komine | 2001-08-07 |
| 6174830 | Silica glass having superior durability against excimer laser beams and method for manufacturing the same | Norio Komine, Seishi Fujiwara, Akiko Yoshida | 2001-01-16 |
| 6129987 | Method of making a piece of glass for measuring transmittance | Satoru Oshikawa, Hiroyuki Hiraiwa | 2000-10-10 |
| 6094940 | Manufacturing method of synthetic silica glass | Seishi Fujiwara, Norio Komine, Toshitsugu Suwa | 2000-08-01 |
| 6087283 | Silica glass for photolithography | Norio Komine, Hiroyuki Hiraiwa | 2000-07-11 |
| 6075607 | Method for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical member | Norio Komine, Seishi Fujiwara | 2000-06-13 |
| 6061174 | Image-focusing optical system for ultraviolet laser | Masaki Shiozawa, Tsutomu Mizugaki, Shigeru Sakuma, Norio Komine, Seishi Fujiwara | 2000-05-09 |
| 6044664 | Synthetic silica glass manufacturing apparatus | Shouji Yajima, Norihisa Yamaguchi, Kazuhiro Nakagawa | 2000-04-04 |
| 6018964 | Method for manufacturing quartz glass | Shouji Yajima | 2000-02-01 |