Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11686479 | Encapsulated cleanroom system | Shiro Hara, Hitoshi Maekawa, Takashi Yajima, Yuuki Ishida | 2023-06-27 |
| 11056410 | Method of manufacturing semiconductor package using alignment mark on wafer | Shiro Hara, Fumito IMURA | 2021-07-06 |
| 10478867 | Treatment liquid supply device using syringe, and wet treatment device | Shiro Hara, Akio Kobayashi, Takeshi Umino, Sonoko Matsuda | 2019-11-19 |
| 10431446 | Wet processing apparatus | Shiro Hara, Shinichi Ikeda, Akihiro Goto, Hiroshi Amano | 2019-10-01 |
| 10304675 | System for integrating preceding steps and subsequent steps | Michihiro Inoue, Shiro Hara, Fumito IMURA, Arami Saruwatari | 2019-05-28 |
| 10286426 | Columnar laminar flow generation device and method for generating columnar laminar flows | Shuuji Okuda, Shiro Hara, Sho Takeuchi, Yoshihisa Sensu, Takahiro Ito | 2019-05-14 |
| 10186489 | Process substrate with crystal orientation mark, method of detecting crystal orientation, and reading device of crystal orientation mark | Shiro Hara, Shinichi Ikeda | 2019-01-22 |
| 10163819 | Surface mount package and manufacturing method thereof | Shiro Hara, Fumito IMURA, Michihiro Inoue, Arami Saruwatari | 2018-12-25 |
| 10163674 | Circular support substrate for semiconductor | Shiro Hara, Fumito IMURA, Michihiro Inoue, Arami Saruwatari | 2018-12-25 |
| 9777375 | Converging mirror furnace | Shinichi Ikeda, Shiro Hara, Takanori Mikahara, Hitoshi Habuka | 2017-10-03 |
| 9513567 | Exposure apparatus and exposure method | Shiro Hara, Yoshiki Inuzuka, Yasuaki Yokoyama | 2016-12-06 |
| 9123795 | Method of manufacturing semiconductor wafers | Yoshio Nakamura, Daizo Ichikawa, Haruo Sumizawa, Shiro Hara, Shinichi Ikeda | 2015-09-01 |
| 9017146 | Wafer polishing apparatus | Yoshio Nakamura, Yoshio Otsuka, Takashi Okubo, Kazutaka Shibuya, Takayuki Fuse +2 more | 2015-04-28 |