Issued Patents All Time
Showing 26–33 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7517809 | Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations | Michael B. Korzenski, Thomas H. Baum, Chongying Xu | 2009-04-14 |
| 7223352 | Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal | Michael B. Korzenski, Chongying Xu, Thomas H. Baum | 2007-05-29 |
| 7160815 | Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations | Michael B. Korzenski, Thomas H. Baum, Chongying Xu | 2007-01-09 |
| 7119052 | Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers | Michael B. Korzenski, Chongying Xu, Thomas H. Baum, David W. Minsek | 2006-10-10 |
| 7011716 | Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products | Chongying Xu, Michael B. Korzenski, Thomas H. Baum, Alexander Borovik | 2006-03-14 |
| 6989358 | Supercritical carbon dioxide/chemical formulation for removal of photoresists | Michael B. Korzenski, Chongying Xu, Thomas H. Baum | 2006-01-24 |
| 6943139 | Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations | Michael B. Korzenski, Chongying Xu, Thomas H. Baum | 2005-09-13 |
| 6735978 | Treatment of supercritical fluid utilized in semiconductor manufacturing applications | Glenn M. Tom, Michael B. Korzenski, Chongying Xu, Thomas H. Baum | 2004-05-18 |