HL

Hang M. Liaw

Motorola: 13 patents #622 of 12,470Top 5%
📍 Scottsdale, AZ: #272 of 3,386 inventorsTop 9%
🗺 Arizona: #2,746 of 32,909 inventorsTop 9%
Overall (All Time): #390,296 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
5891769 Method for forming a semiconductor device having a heteroepitaxial layer Curtis Lee Burt, Stella Q. Hong, Clifford P. Stein 1999-04-06
5520785 Method for enhancing aluminum nitride Keenan L. Evans, Jong-Kai Lin 1996-05-28
5430327 Ohmic contact for III-V semiconductor materials Schyi-yi Wu, Curtis D. Moyer, Steven A. Voight, Israel A. Lesk 1995-07-04
5275971 Method of forming an ohmic contact to III-V semiconductor materials Schyi-yi Wu, Curtis D. Moyer, Steven A. Voight, Israel A. Lesk 1994-01-04
5272096 Method for making a bipolar transistor having a silicon carbide layer Edouard D. de Frésart 1993-12-21
5141887 Low voltage, deep junction device and method Frank S. d'Aragona, Raymond M. Roop, Dennis R. Olsen 1992-08-25
5108946 Method of forming planar isolation regions Peter J. Zdebel, Barbara Vasquez, Christian A. Seelbach 1992-04-28
5080933 Selective deposition of polycrystalline silicon Melissa Grupen-Shemansky 1992-01-14
4963506 Selective deposition of amorphous and polycrystalline silicon Christian A. Seelbach 1990-10-16
4849371 Monocrystalline semiconductor buried layers for electrical contacts to semiconductor devices Kent W. Hansen, Frank S. d'Aragona 1989-07-18
4818323 Method of making a void free wafer via vacuum lamination Frank S. d'Aragona 1989-04-04
4786615 Method for improved surface planarity in selective epitaxial silicon Ha Thi Hoang NGUYEN 1988-11-22
4663831 Method of forming transistors with poly-sidewall contacts utilizing deposition of polycrystalline and insulating layers combined with selective etching and oxidation of said layers Mark S. Birrittella, Robert H. Reuss 1987-05-12