Issued Patents All Time
Showing 1–25 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9991162 | Semiconductor device and manufacturing method thereof | — | 2018-06-05 |
| 9721873 | Semiconductor device and manufacturing method thereof | — | 2017-08-01 |
| 9368459 | Semiconductor chip with seal ring and sacrificial corner pattern | Takeshi Furusawa, Noriko Miura, Kinya Goto | 2016-06-14 |
| 9245800 | Method of manufacturing a semiconductor device | — | 2016-01-26 |
| 9035460 | Semiconductor device and method of manufacturing the same | — | 2015-05-19 |
| 8963291 | Semiconductor chip with seal ring and sacrificial corner pattern | Takeshi Furusawa, Noriko Miura, Kinya Goto | 2015-02-24 |
| 8018030 | Semiconductor chip with seal ring and sacrificial corner pattern | Takeshi Furusawa, Noriko Miura, Kinya Goto | 2011-09-13 |
| 7981790 | Semiconductor device and method of fabricating the same | Teruhiko Kumada, Hideharu Nobutoki, Naoki Yasuda, Kinya Goto | 2011-07-19 |
| 7960279 | Semiconductor device and manufacturing method therefor | Takeshi Furusawa, Noriko Miura, Kinya Goto | 2011-06-14 |
| 7671473 | Semiconductor device and method of fabricating the same | Teruhiko Kumada, Hideharu Nobutoki, Naoki Yasuda, Kinya Goto | 2010-03-02 |
| 7605448 | Semiconductor device with seal ring | Takeshi Furusawa, Noriko Miura, Kinya Goto | 2009-10-20 |
| 7602063 | Semiconductor device and manufacturing method therefor | Takeshi Furusawa, Noriko Miura, Kinya Goto | 2009-10-13 |
| 7208408 | Method for fabricating a dual damascene contact in an insulating film having density gradually varying in the thickness direction | Hiroshi Yuasa, Tetsuo Satake, Kinya Goto | 2007-04-24 |
| 7202565 | Semiconductor device which employs an interlayer insulating film of a low mechanical strength and a highly reliable metal pad, and a method of manufacturing the same | Hiroshi Horibe, Susumu Matsumoto, Tsuyoshi Hamatani | 2007-04-10 |
| 6930394 | Electronic device includes an insulating film having density or carbon concentration varying gradually in the direction of the thickness and a conductive film formed therein | Hiroshi Yuasa, Tetsuo Satake, Kinya Goto | 2005-08-16 |
| 6903027 | Method of forming dielectric film and dielectric film | — | 2005-06-07 |
| 6737319 | Method of manufacturing semiconductor device and semiconductor device | Noboru Morimoto, Kinya Goto | 2004-05-18 |
| 6737746 | Semiconductor device containing copper diffusion preventive film of silicon carbide | — | 2004-05-18 |
| 6551921 | Method of polishing a stack of dielectric layers including a fluorine containing silicon oxide layer | Kinya Goto | 2003-04-22 |
| 6509648 | Method of manufacturing semiconductor device and semiconductor device | Noboru Morimoto, Kinya Goto | 2003-01-21 |
| 6399424 | Method of manufacturing contact structure | Kinya Goto, Noboru Morimoto | 2002-06-04 |
| 6333278 | Semiconductor device and manufacturing method thereof | — | 2001-12-25 |
| 6228778 | Semiconductor device having improved insulation film and manufacturing method thereof | — | 2001-05-08 |
| 6222256 | Semiconductor device and method of manufacturing the same | Kinya Goto | 2001-04-24 |
| 6124641 | Semiconductor device organic insulator film | — | 2000-09-26 |