Issued Patents All Time
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9368459 | Semiconductor chip with seal ring and sacrificial corner pattern | Takeshi Furusawa, Noriko Miura, Masazumi Matsuura | 2016-06-14 |
| 8963291 | Semiconductor chip with seal ring and sacrificial corner pattern | Takeshi Furusawa, Noriko Miura, Masazumi Matsuura | 2015-02-24 |
| 8390135 | Semiconductor device | Yoshihiro Oka | 2013-03-05 |
| 8018030 | Semiconductor chip with seal ring and sacrificial corner pattern | Takeshi Furusawa, Noriko Miura, Masazumi Matsuura | 2011-09-13 |
| 7981790 | Semiconductor device and method of fabricating the same | Teruhiko Kumada, Hideharu Nobutoki, Naoki Yasuda, Masazumi Matsuura | 2011-07-19 |
| 7960279 | Semiconductor device and manufacturing method therefor | Takeshi Furusawa, Noriko Miura, Masazumi Matsuura | 2011-06-14 |
| 7671473 | Semiconductor device and method of fabricating the same | Teruhiko Kumada, Hideharu Nobutoki, Naoki Yasuda, Masazumi Matsuura | 2010-03-02 |
| 7605448 | Semiconductor device with seal ring | Takeshi Furusawa, Noriko Miura, Masazumi Matsuura | 2009-10-20 |
| 7602063 | Semiconductor device and manufacturing method therefor | Takeshi Furusawa, Noriko Miura, Masazumi Matsuura | 2009-10-13 |
| 7208408 | Method for fabricating a dual damascene contact in an insulating film having density gradually varying in the thickness direction | Hiroshi Yuasa, Tetsuo Satake, Masazumi Matsuura | 2007-04-24 |
| 6930394 | Electronic device includes an insulating film having density or carbon concentration varying gradually in the direction of the thickness and a conductive film formed therein | Hiroshi Yuasa, Tetsuo Satake, Masazumi Matsuura | 2005-08-16 |
| 6737319 | Method of manufacturing semiconductor device and semiconductor device | Noboru Morimoto, Masazumi Matsuura | 2004-05-18 |
| 6734489 | Semiconductor element and MIM-type capacitor formed in different layers of a semiconductor device | Noboru Morimoto, Masahiro Matsumoto | 2004-05-11 |
| 6551921 | Method of polishing a stack of dielectric layers including a fluorine containing silicon oxide layer | Masazumi Matsuura | 2003-04-22 |
| 6509648 | Method of manufacturing semiconductor device and semiconductor device | Noboru Morimoto, Masazumi Matsuura | 2003-01-21 |
| 6399424 | Method of manufacturing contact structure | Masazumi Matsuura, Noboru Morimoto | 2002-06-04 |
| 6222256 | Semiconductor device and method of manufacturing the same | Masazumi Matsuura | 2001-04-24 |