KM

Koichi Moriizumi

Mitsubishi Electric: 13 patents #2,044 of 25,717Top 8%
LA Lasertec: 1 patents #25 of 52Top 50%
📍 Itami, JP: #221 of 1,436 inventorsTop 20%
Overall (All Time): #352,525 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
8760642 Substrate inspection apparatus and mask inspection apparatus Zenta Hori, Haruhiko Kusunose 2014-06-24
6343370 Apparatus and process for pattern distortion detection for semiconductor process and semiconductor device manufactured by use of the apparatus or process Hironobu Taoka 2002-01-29
6298473 Apparatus and method for inhibiting pattern distortions to correct pattern data in a semiconductor device Yusaku Ono 2001-10-02
6271852 boundary processing of oblique overlapping graphics to achieve dimensionally accurate electron beam irradiation Kinya Kamiyama, Hironobu Taoka 2001-08-07
6088520 Method of producing highly precise charged beam drawing data divided into plurality of drawing fields Hironobu Taoka, Kinya Kamiyama 2000-07-11
6069971 Pattern comparison inspection system and method employing gray level bit map Makoto Kanno 2000-05-30
5812412 Charged beam pattern data generating method and a charged beam pattern data generating apparatus Kinya Kamiyama, Makoto Kanno, Hironobu Taoka, Hiroomi Nakao, Kazuhiro Yamazaki 1998-09-22
5796408 Charged particle beam drawing data production apparatus and charged particle beam drawing system Kinya Kamiyama, Makoto Kanno, Hironobu Taoka 1998-08-18
5153441 Electron-beam exposure apparatus 1992-10-06
5086398 Electron beam exposure method 1992-02-04
5008830 Method of preparing drawing data for charged beam exposure system Takeshi Fujino 1991-04-16
4984199 Semiconductor memory cells having common contact hole Masahiro Yoneda, Masahiro Hatanaka, Yoshio Kohno, Shinichi Satoh, Hidekazu Oda 1991-01-08
4887137 Semiconductor memory device Masahiro Yoneda, Masahiro Hatanaka, Yoshio Kohno, Shinichi Satoh, Hidekazu Oda 1989-12-12
4794646 Charged beam pattern defect inspection apparatus Susumu Takeuchi 1988-12-27