Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9211626 | Semiconductor device and grinding method of semiconductor device | Takeshi Kondo, Hajime Tsukahara | 2015-12-15 |
| 7235427 | Method for treating substrates for microelectronics and substrates obtained by said method | Thierry Barge, Bruno Ghyselen, Toshiaki Iwamatsu, Junichiro Furihata, Kiyoshi Mitani | 2007-06-26 |
| 6914307 | Semiconductor device and method of manufacturing the same | Toshiaki Iwamatsu, Takashi Ipposhi, Nobuyoshi Hattori, Shigeto Maegawa, Yasuo Yamaguchi +1 more | 2005-07-05 |
| 6902988 | Method for treating substrates for microelectronics and substrates obtained by said method | Thierry Barge, Bruno Ghyselen, Toshiaki Iwamatsu, Junichiro Furihata, Kiyoshi Mitani | 2005-06-07 |
| 6872979 | Semiconductor substrate with stacked oxide and SOI layers with a molten or epitaxial layer formed on an edge of the stacked layers | Yoshiko Yoshida, Yasuhiro Kimura, Yasuo Yamaguchi, Toshiaki Iwamatsu, Yuuichi Hirano | 2005-03-29 |
| 6844242 | Method of manufacturing SOI wafer | Nobuyoshi Hattori, Hidekazu Yamamoto | 2005-01-18 |
| 6673640 | Method of manufacturing semiconductor device for evaluation capable of evaluating crystal defect using in-line test by avoiding using preferential etching process | — | 2004-01-06 |
| 6646306 | Semiconductor device | Toshiaki Iwamatsu, Takashi Ipposhi, Nobuyoshi Hattori, Shigeto Maegawa, Yasuo Yamaguchi +1 more | 2003-11-11 |
| 6563172 | Semiconductor substrate processing method | Yoshiko Yoshida, Yasuhiro Kimura, Yasuo Yamaguchi, Toshiaki Iwamatsu, Yuuichi Hirano | 2003-05-13 |
| 6558990 | SOI substrate, method of manufacture thereof, and semiconductor device using SOI substrate | Masaru Takamatsu, Takashi Katakura, Toshiaki Iwamatsu | 2003-05-06 |
| 6300147 | Method of inspecting semiconductor substrate | — | 2001-10-09 |
| 6252294 | Semiconductor device and semiconductor storage device | Nobuyoshi Hattori, Hidekazu Yamamoto | 2001-06-26 |
| 6232201 | Semiconductor substrate processing method | Yoshiko Yoshida, Yasuhiro Kimura, Yasuo Yamaguchi, Toshiaki Iwamatsu, Yuuichi Hirano | 2001-05-15 |