Issued Patents All Time
Showing 51–73 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6746824 | Reticle design for alternating phase shift mask | Vishnu K. Agarwal | 2004-06-08 |
| 6737200 | Method for aligning a contact or a line to adjacent phase-shifter on a mask | H. Daniel Dulman | 2004-05-18 |
| 6524751 | Reticle design for alternating phase shift mask | Vishnu K. Agarwal | 2003-02-25 |
| 6501188 | Method for improving a stepper signal in a planarized surface over alignment topography | Phillip G. Wald, Kunal R. Parekh | 2002-12-31 |
| 6465138 | Method for designing and making photolithographic reticle, reticle, and photolithographic process | — | 2002-10-15 |
| 6447961 | Optical proximity correction methods, and methods forming radiation-patterning tools | John R. C. Futrell | 2002-09-10 |
| 6418008 | Enhanced capacitor shape | Mark E. Jost, Christophe Pierrat | 2002-07-09 |
| 6413684 | Method to eliminate side lobe printing of attenuated phase shift masks | — | 2002-07-02 |
| 6401236 | Method to eliminate side lobe printing of attenuated phase shift | William Baggenstoss | 2002-06-04 |
| 6391709 | Enhanced capacitor shape | Mark E. Jost, Christophe Pierrat | 2002-05-21 |
| 6376130 | Chromeless alternating reticle for producing semiconductor device features | — | 2002-04-23 |
| 6372639 | Method for constructing interconnects for sub-micron semiconductor devices and the resulting semiconductor devices | — | 2002-04-16 |
| 6369432 | Enhanced capacitor shape | Mark E. Jost, Christophe Pierrat | 2002-04-09 |
| 6319644 | Methods of reducing proximity effects in lithographic processes | Christophe Pierrat, James Burdorf, William Baggenstoss | 2001-11-20 |
| 6284419 | Methods of reducing proximity effects in lithographic processes | Christophe Pierrat, James Burdorf, William Baggenstoss | 2001-09-04 |
| 6258489 | Mask design utilizing dummy features | Vishnu K. Agarwal | 2001-07-10 |
| 6245468 | Optical proximity correction methods, and methods of forming radiation-patterning tools | John R. C. Futrell | 2001-06-12 |
| 6242816 | Method for improving a stepper signal in a planarized surface over alignment topography | Phillip G. Wald, Kunal R. Parekh | 2001-06-05 |
| 6238824 | Method for designing and making photolithographic reticle, reticle, and photolithographic process | John R. C. Futrell, Christophe Pierrat | 2001-05-29 |
| 6214497 | Method to eliminate side lobe printing of attenuated phase shift masks | — | 2001-04-10 |
| 6144109 | Method for improving a stepper signal in a planarized surface over alignment topography | Phillip G. Wald, Kunal R. Parekh | 2000-11-07 |
| 6120952 | Methods of reducing proximity effects in lithographic processes | Christophe Pierrat, James Burdorf, William Baggenstoss | 2000-09-19 |
| 5932491 | Reduction of contact size utilizing formation of spacer material over resist pattern | Phillip G. Wald, Mark Fischer | 1999-08-03 |