Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8728721 | Methods of processing substrates | Kaveri Jain, Zishu Zhang, Anton J. deVilliers, Dan B. Millward, Jianming Zhou +1 more | 2014-05-20 |
| 8658336 | Methods of correcting for variation across substrates during photolithography | Yuan He, Tim H. Bossart | 2014-02-25 |
| 8625078 | Illumination design for lens heating mitigation | Jianming Zhou, Dan B. Millward, Yuan He, Kaveri Jain, Lijing Gou +3 more | 2014-01-07 |
| 8609302 | Lithography methods, methods for forming patterning tools and patterning tools | Jianming Zhou, David A. Kewley, Prasanna Srinivasan, Anton J. deVilliers | 2013-12-17 |
| 8575032 | Methods of forming a pattern on a substrate | Anton J. deVilliers | 2013-11-05 |
| 8507191 | Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same | Dan B. Millward, Yuan He, Lijing Gou, Zishu Zhang, Anton J. deVilliers +3 more | 2013-08-13 |
| 8486611 | Semiconductor constructions and methods of forming patterns | Dan B. Millward, Kaveri Jain, Zishu Zhang, Lijing Gou, Anton J. De Villiers +3 more | 2013-07-16 |
| 8440371 | Imaging devices, methods of forming same, and methods of forming semiconductor device structures | Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Anton J. deVilliers +3 more | 2013-05-14 |
| 7298453 | Method and apparatus for irradiating a microlithographic substrate | Ulrich Boettiger, William T. Rericha, Craig Hickman | 2007-11-20 |
| 7230679 | Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates | Ulrich Boettiger | 2007-06-12 |
| 7046340 | Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates | Ulrich Boettiger | 2006-05-16 |
| 7038762 | Method and apparatus for irradiating a microlithographic substrate | Ulrich Boettiger, William T. Rericha, Craig Hickman | 2006-05-02 |
| 6905975 | Methods of forming patterned compositions | Ulrich Boettiger | 2005-06-14 |
| 6794100 | Method for controlling radiation beam intensity directed to microlithographic substrates | Ulrich Boettiger | 2004-09-21 |
| 6784975 | Method and apparatus for irradiating a microlithographic substrate | Ulrich Boettiger, William T. Rericha, Craig Hickman | 2004-08-31 |
| 6577379 | Method and apparatus for shaping and/or orienting radiation irradiating a microlithographic substrate | Ulrich Boettiger | 2003-06-10 |
| 6545829 | Method and device for improved lithographic critical dimension control | Ulrich Boettiger, Steve W. Bowes | 2003-04-08 |
| 6538830 | Method and device for improved lithographic critical dimension control | Ulrich Boettiger, Steve W. Bowes | 2003-03-25 |
| 6465141 | Method for improved lithographic critical dimension control | Ulrich Boettiger, Steve W. Bowes | 2002-10-15 |