MW

Michael A. Walker

Micron: 73 patents #213 of 6,345Top 4%
SA Spirit Aerosystems: 2 patents #52 of 183Top 30%
TB The Boeing: 2 patents #5,172 of 15,756Top 35%
UN Unknown: 1 patents #29,356 of 83,584Top 40%
HH Hitachi High-Technologies: 1 patents #674 of 1,200Top 60%
📍 Wichita, KS: #2 of 1,728 inventorsTop 1%
🗺 Kansas: #42 of 12,005 inventorsTop 1%
Overall (All Time): #22,737 of 4,157,543Top 1%
80
Patents All Time

Issued Patents All Time

Showing 51–75 of 80 patents

Patent #TitleCo-InventorsDate
6200901 Polishing polymer surfaces on non-porous CMP pads Guy F. Hudson 2001-03-13
6180450 Semiconductor processing methods of forming stacked capacitors Charles H. Dennison 2001-01-30
6168986 Method of making a sacrificial self-aligned interconnect structure Karl M. Robinson 2001-01-02
6136043 Polishing pad methods of manufacture and use Karl M. Robinson, John Skrovan 2000-10-24
6103627 Treatment of a surface having an exposed silicon/silica interface Karl M. Robinson 2000-08-15
6096650 Treatment of a surface having exposed silica Karl M. Robinson 2000-08-01
6090475 Polishing pad, methods of manufacturing and use Karl M. Robinson, John Skrovan 2000-07-18
6044851 Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication Eric K. Grieger, Michael T. Andreas 2000-04-04
6037218 Semiconductor processing methods of forming stacked capacitors Charles H. Dennison 2000-03-14
5990012 Chemical-mechanical polishing of hydrophobic materials by use of incorporated-particle polishing pads Karl M. Robinson 1999-11-23
5981396 Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers Karl M. Robinson 1999-11-09
5963814 Method of forming recessed container cells by wet etching conductive layer and dissimilar layer formed over conductive layer Michael T. Andreas 1999-10-05
5942131 Treatment of a surface having an expose silicon/silica interface Karl M. Robinson 1999-08-24
5919082 Fixed abrasive polishing pad Karl M. Robinson 1999-07-06
5893754 Method for chemical-mechanical planarization of stop-on-feature semiconductor wafers Karl M. Robinson 1999-04-13
5855811 Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication Eric K. Grieger, Michael T. Andreas 1999-01-05
5855804 Method and apparatus for stopping mechanical and chemical-mechanical planarization of substrates at desired endpoints 1999-01-05
5779522 Directional spray pad scrubber Karl M. Robinson 1998-07-14
5733176 Polishing pad and method of use Karl M. Robinson 1998-03-31
5690540 Spiral grooved polishing pad for chemical-mechanical planarization of semiconductor wafers Richard L. Elliott 1997-11-25
5686038 Resin transfer molding of composite materials that emit volatiles during processing Stephen Christensen 1997-11-11
5652164 Semiconductor processing methods of forming stacked capacitors Charles H. Dennison 1997-07-29
5649262 Film cleaning apparatus and method Terence Andrew Watts 1997-07-15
5645737 Wet clean for a surface having an exposed silicon/silica interface Karl M. Robinson 1997-07-08
5616069 Directional spray pad scrubber Karl M. Robinson 1997-04-01