Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7276765 | Buried transistors for silicon on insulator technology | Theodore M. Taylor, Won-joo Kim | 2007-10-02 |
| 6900500 | Buried transistors for silicon on insulator technology | Theodore M. Taylor, Won-joo Kim | 2005-05-31 |
| 6739955 | Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies | — | 2004-05-25 |
| 6509272 | Planarization method using fluid composition including chelating agents | Scott Meikle | 2003-01-21 |
| 6391779 | Planarization process | — | 2002-05-21 |
| 6361413 | Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic device substrate assemblies | — | 2002-03-26 |
| 6309282 | Variable abrasive polishing pad for mechanical and chemical-mechanical planarization | David Q. Wright | 2001-10-30 |
| 6280924 | Planarization method using fluid composition including chelating agents | Scott Meikle | 2001-08-28 |
| 6277746 | Methods of reducing corrosion of materials, methods of protecting aluminum within aluminum-comprising layers from electrochemical degradation during semiconductor processing, and semicoductor processing methods of forming aluminum-comprising lines | Allen McTeer | 2001-08-21 |
| 6203413 | Apparatus and methods for conditioning polishing pads in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies | — | 2001-03-20 |
| 6186870 | Variable abrasive polishing pad for mechanical and chemical-mechanical planarization | David Q. Wright | 2001-02-13 |
| 6136043 | Polishing pad methods of manufacture and use | Karl M. Robinson, Michael A. Walker | 2000-10-24 |
| 6136218 | Planarization fluid composition including chelating agents | Scott Meikle | 2000-10-24 |
| 6110830 | Methods of reducing corrosion of materials, methods of protecting aluminum within aluminum-comprising layers from electrochemical degradation during semiconductor processing methods of forming aluminum-comprising lines | Allen McTeer | 2000-08-29 |
| 6090475 | Polishing pad, methods of manufacturing and use | Karl M. Robinson, Michael A. Walker | 2000-07-18 |
| 6062958 | Variable abrasive polishing pad for mechanical and chemical-mechanical planarization | David Q. Wright | 2000-05-16 |
| 6060395 | Planarization method using a slurry including a dispersant | Karl M. Robinson | 2000-05-09 |
| 6048405 | Megasonic cleaning methods and apparatus | Guy F. Hudson | 2000-04-11 |
| 6006765 | Megasonic cleaning methods and apparatus | Guy F. Hudson | 1999-12-28 |
| 5916819 | Planarization fluid composition chelating agents and planarization method using same | Scott Meikle | 1999-06-29 |
| 5849091 | Megasonic cleaning methods and apparatus | Guy F. Hudson | 1998-12-15 |
| 5846336 | Apparatus and method for conditioning a planarizing substrate used in mechanical and chemical-mechanical planarization of semiconductor wafers | — | 1998-12-08 |
| 5827781 | Planarization slurry including a dispersant and method of using same | Karl M. Robinson | 1998-10-27 |
| 5645682 | Apparatus and method for conditioning a planarizing substrate used in chemical-mechanical planarization of semiconductor wafers | — | 1997-07-08 |