Issued Patents All Time
Showing 51–65 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6099604 | Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto | Gurtej S. Sandhu, Daniel A. Koos | 2000-08-08 |
| 6012469 | Etch residue clean | Li Li, Donald L. Yates | 2000-01-11 |
| 5902651 | Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds | Brenda D. Wanner, David R. Atwell | 1999-05-11 |
| 5888906 | Plasmaless dry contact cleaning method using interhalogen compounds | Gurtej S. Sandhu | 1999-03-30 |
| 5824365 | Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor | Gurtej S. Sandhu, Ravi Iyer | 1998-10-20 |
| 5783495 | Method of wafer cleaning, and system and cleaning solution regarding same | Li Li, Richard C. Hawthorne, Kevin J. Torek | 1998-07-21 |
| 5693377 | Method of reducing carbon incorporation into films produced by chemical vapor deposition involving titanium organometallic and metal-organic precursor compounds | Brenda D. Wanner, David R. Atwell | 1997-12-02 |
| 5674574 | Vapor delivery system for solid precursors and method regarding same | David R. Atwell | 1997-10-07 |
| 5393564 | High efficiency method for performing a chemical vapor deposition utilizing a nonvolatile precursor | Gurtej S. Sandhu | 1995-02-28 |
| 5384289 | Reductive elimination chemical vapor deposition processes utilizing organometallic precursor compounds in semiconductor wafer processing | — | 1995-01-24 |
| 5377429 | Method and appartus for subliming precursors | Gurtej S. Sandhu, Scott Meikle | 1995-01-03 |
| 5368687 | Semiconductor processing method of etching insulating inorganic metal oxide materials and method of cleaning metals from the surface of semiconductor wafers | Gurtej S. Sandhu, Pierre C. Fazan | 1994-11-29 |
| 5318927 | Methods of chemical-mechanical polishing insulating inorganic metal oxide materials | Gurtej S. Sandhu, Trung T. Doan | 1994-06-07 |
| 5231306 | Titanium/aluminum/nitrogen material for semiconductor devices | Scott Meikle, Sung-Cheol Kim | 1993-07-27 |
| 5227331 | CVD method for semiconductor manufacture using rapid thermal pulses | — | 1993-07-13 |