Issued Patents All Time
Showing 26–50 of 65 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6830838 | Chemical vapor deposition of titanium | Gurtej S. Sandhu | 2004-12-14 |
| 6827871 | Ruthenium and ruthenium dioxide removal method and material | — | 2004-12-07 |
| 6812990 | Method for making sol gel spacers for flat panel displays | James J. Hofmann, Brian A. Vaartstra, Brenda D. Kraus | 2004-11-02 |
| 6783657 | Systems and methods for the electrolytic removal of metals from substrates | Eugene P. Marsh, Stefan Uhlenbrock | 2004-08-31 |
| 6703319 | Compositions and methods for removing etch residue | Donald L. Yates | 2004-03-09 |
| 6664159 | Mixed metal nitride and boride barrier layers | Brian A. Vaartstra | 2003-12-16 |
| 6607173 | Film on a surface of a mold used during semiconductor device fabrication | — | 2003-08-19 |
| 6544466 | Surface modification method for molds used during semiconductor device fabrication | — | 2003-04-08 |
| 6537462 | Ruthenium and ruthenium dioxide removal method and material | — | 2003-03-25 |
| 6523803 | Mold apparatus used during semiconductor device fabrication | — | 2003-02-25 |
| 6503842 | Plasmaless dry contact cleaning method using interhalogen compounds | Gurtej S. Sandhu | 2003-01-07 |
| 6454957 | Ruthenium and ruthenium dioxide removal method and material | — | 2002-09-24 |
| 6451214 | Ruthenium and ruthenium dioxide removal method and material | — | 2002-09-17 |
| 6446933 | Film on a surface of a mold used during semiconductor device fabrication | — | 2002-09-10 |
| 6445023 | Mixed metal nitride and boride barrier layers | Brian A. Vaartstra | 2002-09-03 |
| 6433434 | Apparatus having a titanium alloy layer | Gurtej S. Sandhu | 2002-08-13 |
| 6428623 | Chemical vapor deposition apparatus with liquid feed | Gurtej S. Sandhu | 2002-08-06 |
| 6312486 | Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto | Gurtej S. Sandhu, Daniel A. Koos | 2001-11-06 |
| 6284316 | Chemical vapor deposition of titanium | Gurtej S. Sandhu | 2001-09-04 |
| 6235145 | System for wafer cleaning | Li Li, Richard C. Hawthorne, Kevin J. Torek | 2001-05-22 |
| 6201219 | Chamber and cleaning process therefor | Gurtej S. Sandhu, Ravi Iyer | 2001-03-13 |
| 6192899 | Etch residue clean with aqueous HF/organic solution | Li Li, Donald L. Yates | 2001-02-27 |
| 6162499 | Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor | Gurtej S. Sandhu, Ravi Iyer | 2000-12-19 |
| 6143192 | Ruthenium and ruthenium dioxide removal method and material | — | 2000-11-07 |
| 6143362 | Chemical vapor deposition of titanium | Gurtej S. Sandhu | 2000-11-07 |