Issued Patents All Time
Showing 176–199 of 199 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5260517 | Interconnect lead with stress joint | — | 1993-11-09 |
| 5259799 | Method to form self-aligned gate structures and focus rings | Trung T. Doan, Tyler Lowrey, J. Brett Rolfson | 1993-11-09 |
| 5244842 | Method of increasing capacitance by surface roughening in semiconductor wafer processing | Mark E. Tuttle, Tyler Lowrey | 1993-09-14 |
| 5240871 | Corrugated storage contact capacitor and method for forming a corrugated storage contact capacitor | Trung T. Doan | 1993-08-31 |
| 5232549 | Spacers for field emission display fabricated via self-aligned high energy ablation | Chris C. Yu, Trung T. Doan, Tyler Lowrey, J. Brett Rolfson | 1993-08-03 |
| 5229331 | Method to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technology | Trung T. Doan, J. Brett Rolfson, Tyler Lowrey | 1993-07-20 |
| 5223083 | Process for etching a semiconductor device using an improved protective etching mask | J. Brett Rolfson | 1993-06-29 |
| 5205770 | Method to form high aspect ratio supports (spacers) for field emission display using micro-saw technology | Tyler Lowrey, Trung T. Doan, J. Brett Rolfson | 1993-04-27 |
| 5194344 | Method of fabricating phase shift reticles including chemically mechanically planarizing | J. Brett Rolfson | 1993-03-16 |
| 5194346 | Method of fabricating phase shifting reticles with an accurate phase shift layer | J. Brett Rolfson | 1993-03-16 |
| 5186670 | Method to form self-aligned gate structures and focus rings | Trung T. Doan, Tyler Lowrey, J. Brett Rolfson | 1993-02-16 |
| 5185058 | Process for etching semiconductor devices | — | 1993-02-09 |
| 5167762 | Anisotropic etch method | Robert Carr | 1992-12-01 |
| 5151168 | Process for metallizing integrated circuits with electrolytically-deposited copper | Terry L. Gilton, Mark E. Tuttle | 1992-09-29 |
| 5100505 | Process for etching semiconductor devices | — | 1992-03-31 |
| 5096536 | Method and apparatus useful in the plasma etching of semiconductor materials | — | 1992-03-17 |
| 5082524 | Addition of silicon tetrabromide to halogenated plasmas as a technique for minimizing photoresist deterioration during the etching of metal layers | — | 1992-01-21 |
| 5069747 | Creation and removal of temporary silicon dioxide structures on an in-process integrated circuit with minimal effect on exposed, permanent silicon dioxide structures | Mark E. Tuttle, Ruojia Lee, Tyler Lowrey | 1991-12-03 |
| 5049520 | Method of partially eliminating the bird's beak effect without adding any process steps | — | 1991-09-17 |
| 5024722 | Process for fabricating conductors used for integrated circuit connections and the like | — | 1991-06-18 |
| 5001085 | Process for creating a metal etch mask which may be utilized for halogen-plasma excavation of deep trenches | Trung T. Doan | 1991-03-19 |
| 5000208 | Wafer rinser/dryer | Bryan Ludwig, Ernest E. Marks, Leo B. Jurica, L. Brian Dunn, Loyal Gibbons | 1991-03-19 |
| 4992137 | Dry etching method and method for prevention of low temperature post etch deposit | Harlan Frankamp | 1991-02-12 |
| 4859304 | Temperature controlled anode for plasma dry etchers for etching semiconductor | John C. Freeman, James L. Dale, William J. Crane, Eric Powell, Jeffrey V. Musser | 1989-08-22 |