Issued Patents All Time
Showing 151–175 of 199 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5537738 | Methods of mechanical and electrical substrate connection | Charles M. Watkins, Derek Gochnour | 1996-07-23 |
| 5532177 | Method for forming electron emitters | — | 1996-07-02 |
| 5503582 | Method for forming spacers for display devices employing reduced pressures | Jim J. Browing | 1996-04-02 |
| 5496762 | Highly resistive structures for integrated circuits and method of manufacturing the same | Gurtej S. Sandhu, Trung T. Doan | 1996-03-05 |
| 5486126 | Spacers for large area displays | James J. Hofmann, Danny Dynka, Darryl M. Stansbury | 1996-01-23 |
| 5438240 | Field emission structures produced on macro-grain polysilicon substrates | J. Brett Rolfson, Tyler Lowrey, Trung T. Doan | 1995-08-01 |
| 5409563 | Method for etching high aspect ratio features | — | 1995-04-25 |
| 5403435 | Process for selectively etching integrated circuit devices having deep trenches or troughs or elevated features with re-entrant profiles | J. Brett Rolfson | 1995-04-04 |
| 5391259 | Method for forming a substantially uniform array of sharp tips | Kevin Tjaden | 1995-02-21 |
| 5372973 | Method to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technology | Trung T. Doan, J. Brett Rolfson, Tyler Lowrey | 1994-12-13 |
| 5372901 | Removable bandpass filter for microlithographic aligners | J. Brett Rolfson | 1994-12-13 |
| 5358601 | Process for isotropically etching semiconductor devices | — | 1994-10-25 |
| 5358599 | Process for etching a semiconductor device using an improved protective etching mask | J. Brett Rolfson | 1994-10-25 |
| 5354698 | Hydrogen reduction method for removing contaminants in a semiconductor ion implantation process | — | 1994-10-11 |
| 5344525 | Process for etching semiconductor devices | — | 1994-09-06 |
| 5342477 | Low resistance electrodes useful in flat panel displays | — | 1994-08-30 |
| 5329207 | Field emission structures produced on macro-grain polysilicon substrates | J. Brett Rolfson, Tyler Lowrey, Trung T. Doan | 1994-07-12 |
| 5328810 | Method for reducing, by a factor or 2.sup.-N, the minimum masking pitch of a photolithographic process | Tyler Lowrey, Randal W. Chance | 1994-07-12 |
| 5314578 | Process for etching a multi-layer substrate | — | 1994-05-24 |
| 5302241 | Post etching treatment of semiconductor devices | — | 1994-04-12 |
| 5300463 | Method of selectively etching silicon dioxide dielectric layers on semiconductor wafers | J. Brett Rolfson | 1994-04-05 |
| 5298463 | Method of processing a semiconductor wafer using a contact etch stop | Gurtej S. Sandhu | 1994-03-29 |
| 5288568 | Optical spacer method for preventing null formation in phase shifted photomasks | — | 1994-02-22 |
| 5281500 | Method of preventing null formation in phase shifted photomasks | Brett Rolfson | 1994-01-25 |
| 5277715 | Method of reducing particulate concentration in process fluids | — | 1994-01-11 |