Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7538036 | Methods of forming openings, and methods of forming container capacitors | Brett W. Busch, Luan C. Tran, Fred Fishburn, Yoshiki Hishiro, Ulrich Boettiger +1 more | 2009-05-26 |
| 7408265 | Use of a dual-tone resist to form photomasks including alignment mark protection, intermediate semiconductor device structures and bulk semiconductor device substrates | Richard Holscher | 2008-08-05 |
| 7321149 | Capacitor structures, and DRAM arrays | Brett W. Busch, Luan C. Tran, Fred Fishburn, Richard Holscher | 2008-01-22 |
| 7153778 | Methods of forming openings, and methods of forming container capacitors | Brett W. Busch, Luan C. Tran, Fred Fishburn, Yoshiki Hishiro, Ulrich Boettiger +1 more | 2006-12-26 |
| 7057263 | Semiconductor wafer assemblies comprising photoresist over silicon nitride materials | John T. Moore, Scott DeBoer, Mark Fischer, J. Brett Rolfson, Annette L. Martin | 2006-06-06 |
| 6693345 | Semiconductor wafer assemblies comprising photoresist over silicon nitride materials | John T. Moore, Scott DeBoer, Mark Fischer, J. Brett Rolfson, Annette L. Martin | 2004-02-17 |
| 6461950 | Semiconductor processing methods, semiconductor circuitry, and gate stacks | Zhiping Yin, Ravi Iyer, Thomas R. Glass, Richard Holscher, Linda K. Somerville +1 more | 2002-10-08 |
| 6451504 | Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride | J. Brett Rolfson, Annette L. Martin | 2002-09-17 |
| 6417559 | Semiconductor wafer assemblies comprising photoresist over silicon nitride materials | John T. Moore, Scott DeBoer, Mark Fischer, J. Brett Rolfson, Annette L. Martin | 2002-07-09 |
| 6383723 | Method to clean substrate and improve photoresist profile | Ravi Iyer | 2002-05-07 |
| 6323139 | Semiconductor processing methods of forming photoresist over silicon nitride materials | John T. Moore, Scott DeBoer, Mark Fischer, J. Brett Rolfson, Annette L. Martin | 2001-11-27 |
| 6297171 | Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride | J. Brett Rolfson, Annette L. Martin | 2001-10-02 |
| 6281100 | Semiconductor processing methods | Zhiping Yin, Ravi Iyer, Thomas R. Glass, Richard Holscher, Linda K. Somerville +1 more | 2001-08-28 |
| 6228740 | Method of making an antireflective structure | Fernando Gonzalez | 2001-05-08 |
| 6107002 | Reducing resist shrinkage during device fabrication | Richard Holscher | 2000-08-22 |
| 5990002 | Method of making an antireflective structure | Fernando Gonzalez | 1999-11-23 |
| 5926739 | Semiconductor processing method of promoting photoresist adhesion to an outer substrate layer predominately comprising silicon nitride | J. Brett Rolfson, Annette L. Martin | 1999-07-20 |
| 5886391 | Antireflective structure | Fernando Gonzalez | 1999-03-23 |
| 5259924 | Integrated circuit fabrication process to reduce critical dimension loss during etching | Viju K. Mathews, Guy T. Blalock, Pierre C. Fazan | 1993-11-09 |