Issued Patents All Time
Showing 201–225 of 225 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6780741 | Method of forming a novel gate electrode structure comprised of a silicon-germanium layer located between random grained polysilicon layers | Chia-Lin Chen, Liang-Gi Yao | 2004-08-24 |
| 6780788 | Methods for improving within-wafer uniformity of gate oxide | Chi-Chun Chen, Ming-Fang Wang | 2004-08-24 |
| 6767274 | Method to reduce defect/slurry residue for copper CMP | Chi-Chun Chen, Weng Chang | 2004-07-27 |
| 6767847 | Method of forming a silicon nitride-silicon dioxide gate stack | Chien-Ming Hu, Chien-Hao Chen, Mo Yu, Mong-Song Liang | 2004-07-27 |
| 6764959 | Thermal compensation method for forming semiconductor integrated circuit microelectronic fabrication | Mo Yu, Chen-Hua Yu | 2004-07-20 |
| 6764927 | Chemical vapor deposition (CVD) method employing wetting pre-treatment | Liang-Gi Yao, Ming-Fang Wang, Yeou-Ming Lin, Tuo-Hung Ho | 2004-07-20 |
| 6737362 | Method for manufacturing a thin gate dielectric layer for integrated circuit fabrication | Chia-Lin Chen, Chun-Lin Wu, Chi-Chun Chen, Tze-Liang Lee | 2004-05-18 |
| 6727134 | Method of forming a nitride gate dielectric layer for advanced CMOS devices | Chi-Chun Chen, Tze-Liang Lee | 2004-04-27 |
| 6706581 | Dual gate dielectric scheme: SiON for high performance devices and high k for low power devices | Tou-Hung Hou, Ming-Fang Wang, Chi-Chun Chen, Chih-Wei Yang, Liang-Gi Yao | 2004-03-16 |
| 6656764 | Process for integration of a high dielectric constant gate insulator layer in a CMOS device | Ming-Fang Wang, Chien-Hao Chen, Liang-Gi Yao | 2003-12-02 |
| 6649535 | Method for ultra-thin gate oxide growth | Mo Yu | 2003-11-18 |
| 6642117 | Method for forming composite dielectric layer | Chi-Chun Chen, Tze-Liang Lee | 2003-11-04 |
| 6624090 | Method of forming plasma nitrided gate dielectric layers | Mo Yu, Chien-Hao Chen | 2003-09-23 |
| 6602799 | Method of forming a uniform ultra-thin gate oxide layer | Chi-Chun Chen, Wen-Shan Chang, Michael Chang | 2003-08-05 |
| 6568849 | Temperature probe with improved structure integrity and operation reliability over high temperature and voltage | Yih-Wen Shiao | 2003-05-27 |
| 6509257 | Semiconductor device and process for making the same | — | 2003-01-21 |
| 6495422 | Methods of forming high-k gate dielectrics and I/O gate oxides for advanced logic application | Mo Yu | 2002-12-17 |
| D465114 | Backrest cover | — | 2002-11-05 |
| 6465323 | Method for forming semiconductor integrated circuit microelectronic fabrication having multiple gate dielectric layers with multiple thicknesses | Mo Yu, Chen-Hua Yu | 2002-10-15 |
| 6455330 | Methods to create high-k dielectric gate electrodes with backside cleaning | Liang-Gi Yao, Ming-Fang Wang, Mong-Song Liang | 2002-09-24 |
| 6333534 | Semiconductor device and method of fabricating | — | 2001-12-25 |
| 6156619 | Semiconductor device and method of fabricating | — | 2000-12-05 |
| 5525543 | Method of making a semiconductor device using a titanium-rich silicide film | — | 1996-06-11 |
| 5462895 | Method of making semiconductor device comprising a titanium nitride film | — | 1995-10-31 |
| 4726550 | Comprehensive airplane safety system | Bao Chien Chen | 1988-02-23 |