| 8653357 |
Method for heat dissipation on semiconductor device |
Zachary Prather, Michael Berman |
2014-02-18 |
| 8404960 |
Method for heat dissipation on semiconductor device |
Zachary Prather, Michael Berman |
2013-03-26 |
| 7332062 |
Electroplating tool for semiconductor manufacture having electric field control |
Michael Berman |
2008-02-19 |
| 7314527 |
Reactor system |
Preston E. Pillow |
2008-01-01 |
| 7198546 |
Method to monitor pad wear in CMP processing |
Michael Berman, Matthew Trattles |
2007-04-03 |
| 7183787 |
Contact resistance device for improved process control |
Michael Berman |
2007-02-27 |
| 7067048 |
Method to improve the control of electro-polishing by use of a plating electrode an electrolyte bath |
Michael Berman |
2006-06-27 |
| 6982206 |
Mechanism for improving the structural integrity of low-k films |
Michael Berman, Hemanshu Bhatt |
2006-01-03 |
| 6971944 |
Method and control system for improving CMP process by detecting and reacting to harmonic oscillation |
Michael Berman, Bruce Whitefield |
2005-12-06 |
| 6927177 |
Chemical mechanical electropolishing system |
Michael Berman |
2005-08-09 |
| 6874510 |
Method to use a laser to perform the edge clean operation on a semiconductor wafer |
Michael Berman, Rennie Barber |
2005-04-05 |
| 6869893 |
Laminate low K film |
Michael Berman, Rennie Barber |
2005-03-22 |
| 6837967 |
Method and apparatus for cleaning deposited films from the edge of a wafer |
Michael Berman, Rennie Barber |
2005-01-04 |
| 6743701 |
Method for the formation of active area utilizing reverse trench isolation |
Michael Berman, Derryl D. J. Allman |
2004-06-01 |
| 6739953 |
Mechanical stress free processing method |
Michael Berman |
2004-05-25 |
| 6650958 |
Integrated process tool monitoring system for semiconductor fabrication |
Attila Balázs, Bruce Whitefield, Hiroshi Mizuno, Russell Whaley, Paul Szasz |
2003-11-18 |
| 6649537 |
Intermittent pulsed oxidation process |
Hemanshu Bhatt |
2003-11-18 |
| 6635116 |
Residual oxygen reduction system |
Mark Mayeda, Richard Gimmi, Matthew Trattles |
2003-10-21 |
| 6574525 |
In situ measurement |
Hemanshu Bhatt |
2003-06-03 |
| 6355577 |
System to reduce particulate contamination |
Ynhi Le |
2002-03-12 |
| 6328347 |
Uniform axial loading ground glass joint clamp |
Preston E. Pillow, William Loren Emery |
2001-12-11 |
| 5146869 |
Tube and injector for preheating gases in a chemical vapor deposition reactor |
Kenneth W. Bohannon, Kuppuswamy Srikrishna, Anthony F. Sholing |
1992-09-15 |
