Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5284561 | Method and apparatus for sputter coating employing machine readable indicia carried by target assembly | Frank M. Shinneman | 1994-02-08 |
| 5237756 | Method and apparatus for reducing particulate contamination | — | 1993-08-24 |
| 5223108 | Extended lifetime collimator | — | 1993-06-29 |
| 5205051 | Method of preventing condensation of air borne moisture onto objects in a vessel during pumping thereof | — | 1993-04-27 |
| 5174875 | Method of enhancing the performance of a magnetron sputtering target | Arnold J. Aronson, Charles Nicholas Van Nutt | 1992-12-29 |
| 5154730 | Semiconductor wafer processing module having an inclined rotating wafer handling turret and a method of using the module | Julian Hodos | 1992-10-13 |
| 5130005 | Magnetron sputter coating method and apparatus with rotating magnet cathode | Robert Hieronymi, Israel A. Wagner | 1992-07-14 |
| 5126028 | Sputter coating process control method and apparatus | Israel A. Wagner, Robert Hieronymi, Charles Nicholas Van Nutt, Richard C. Edwards, Donald A. Messina | 1992-06-30 |
| 5080772 | Method of improving ion flux distribution uniformity on a substrate | Israel A. Wagner, Robert Hieronymi | 1992-01-14 |
| 4957605 | Method and apparatus for sputter coating stepped wafers | Israel A. Wagner, Robert Hieronymi, Charles Nicholas Van Nutt | 1990-09-18 |
| 4909695 | Method and apparatus for handling and processing wafer-like materials | Miroslav Eror, Richard E. Biehl | 1990-03-20 |
| 4871433 | Method and apparatus for improving the uniformity ion bombardment in a magnetron sputtering system | Israel A. Wagner | 1989-10-03 |
| 4855033 | Cathode and target design for a sputter coating apparatus | — | 1989-08-08 |
| 4581118 | Shaped field magnetron electrode | Walter H. Class, Lin I | 1986-04-08 |
| 4525262 | Magnetron reactive bias sputtering method and apparatus | Walter H. Class, Michael Hill | 1985-06-25 |
| 4472259 | Focusing magnetron sputtering apparatus | Walter H. Class, Arnold J. Aronson, Michael Hill | 1984-09-18 |
| 4428816 | Focusing magnetron sputtering apparatus | Walter H. Class, Robert Hieronymi | 1984-01-31 |
| 4422896 | Magnetically enhanced plasma process and apparatus | Walter H. Class, Michael Hill, Marvin Hutt | 1983-12-27 |
| 4198283 | Magnetron sputtering target and cathode assembly | Walter H. Class, George J. Unterkofler | 1980-04-15 |