Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9947513 | Edge ramping | John C. Valcore, Jr., Andrew Fong | 2018-04-17 |
| 9842725 | Using modeling to determine ion energy associated with a plasma system | John C. Valcore, Jr. | 2017-12-12 |
| 9812294 | Sub-pulsing during a state | John C. Valcore, Jr., Harmeet Singh | 2017-11-07 |
| 9720022 | Systems and methods for providing characteristics of an impedance matching model for use with matching networks | Arthur M. Howald, John C. Valcore, Jr., Seyed Jafar Jafarian-Tehrani | 2017-08-01 |
| 9673026 | Edge ramping | John C. Valcore, Jr., Andrew Fong | 2017-06-06 |
| 9627182 | Tuning a parameter associated with plasma impedance | John C. Valcore, Jr. | 2017-04-18 |
| 9620334 | Control of etch rate using modeling, feedback and impedance match | John C. Valcore, Jr., Alexei Marakhtanov, Seyed Jafar Jafarian-Tehrani, Zhigang Chen | 2017-04-11 |
| 9620337 | Determining a malfunctioning device in a plasma system | John C. Valcore, Jr., Arthur H. Sato | 2017-04-11 |
| 9607810 | Impedance-based adjustment of power and frequency | John C. Valcore, Jr. | 2017-03-28 |
| 9502216 | Using modeling to determine wafer bias associated with a plasma system | John C. Valcore, Jr. | 2016-11-22 |
| 9462672 | Adjustment of power and frequency based on three or more states | John C. Valcore, Jr. | 2016-10-04 |
| 9408288 | Edge ramping | John C. Valcore, Jr., Andrew Fong | 2016-08-02 |
| 9390893 | Sub-pulsing during a state | John C. Valcore, Jr., Harmeet Singh | 2016-07-12 |
| 9368329 | Methods and apparatus for synchronizing RF pulses in a plasma processing system | John C. Valcore, Jr., Harmeet Singh | 2016-06-14 |
| 9320126 | Determining a value of a variable on an RF transmission model | John C. Valcore, Jr. | 2016-04-19 |
| 9320127 | Tuning a parameter associated with plasma impedance | John C. Valcore, Jr. | 2016-04-19 |
| 9236228 | Frequency enhanced impedance dependent power control for multi-frequency RF pulsing | John C. Valcore, Jr. | 2016-01-12 |
| 9197196 | State-based adjustment of power and frequency | John C. Valcore, Jr. | 2015-11-24 |
| 9171699 | Impedance-based adjustment of power and frequency | John C. Valcore, Jr. | 2015-10-27 |
| 9155182 | Tuning a parameter associated with plasma impedance | John C. Valcore, Jr. | 2015-10-06 |
| 9114666 | Methods and apparatus for controlling plasma in a plasma processing system | John C. Valcore, Jr. | 2015-08-25 |
| 9030101 | Frequency enhanced impedance dependent power control for multi-frequency RF pulsing | John C. Valcore, Jr. | 2015-05-12 |
| 7193173 | Reducing plasma ignition pressure | Mark Wiepking, Andras Kuthi, Andreas Fischer | 2007-03-20 |
| 5537080 | Gain stability arrangement for HV MOSFET power amplifier | Yogendra K. Chawla | 1996-07-16 |