TM

Takeo Maeda

KT Kabushiki Kaisha Toshiba: 26 patents #1,029 of 21,451Top 5%
HI Hitachi: 2 patents #13,388 of 28,497Top 50%
FC Fuji Electrochemical Co.: 1 patents #38 of 99Top 40%
KC Kao Soap Co.: 1 patents #82 of 203Top 45%
Overall (All Time): #126,266 of 4,157,543Top 4%
30
Patents All Time

Issued Patents All Time

Showing 1–25 of 30 patents

Patent #TitleCo-InventorsDate
5677229 Method for manufacturing semiconductor device isolation region Shigeru Morita, Fumitomo Matsuoka, Hisao Yoshimura 1997-10-14
5597757 Method of manufacturing a semiconductor device including bipolar and MOS transistors Hiroshi Momose 1997-01-28
5583363 Inverter gate circuit of a bi-CMOS structure having common layers between fets and bipolar transistors Hiroshi Momose, Koji Makita 1996-12-10
5576572 Semiconductor integrated circuit device and method of manufacturing the same Hiroshi Gojohbori 1996-11-19
5523242 Method of manufacturing a BiMOS device Hiroshi Momose 1996-06-04
5512772 Semiconductor device having bipolar transistor and MOS transistor Hiroshi Momose, Yukihiro Urakawa, Masataka Matsui 1996-04-30
5506168 Method for manufacturing semiconductor device Shigeru Morita, Fumitomo Matsuoka, Hisao Yoshimura 1996-04-09
5489795 Semiconductor integrated circuit device having double well structure Hisao Yoshimura, Masakazu Kakumu 1996-02-06
5485034 Semiconductor device including bipolar transistor having shallowed base Hiroshi Gojohbori, Yoshitaka Tsunashima 1996-01-16
5442226 Bipolar transistor having an emitter electrode formed of polysilicon Hiroshi Gojohbori, Takeo Nakayama 1995-08-15
5406115 Semiconductor device including bipolar transistor having shallowed base and method for manufacturing the same Hiroshi Gojohbori, Yoshitaka Tsunashima 1995-04-11
5399894 Semiconductor device having bipolar transistor and MOS transistor Hiroshi Momose, Yukihiro Urakawa, Masataka Matsui 1995-03-21
5340751 Method of manufacturing a BiMOS device Hiroshi Momose 1994-08-23
5341021 Bipolar transistor having an electrode structure suitable for integration Hiroshi Momose 1994-08-23
5278099 Method for manufacturing a semiconductor device having wiring electrodes 1994-01-11
5243557 Bi-CMOS semiconductor integrated circuit Yukari Unno, Hiroshi Momose, Masataka Matsui 1993-09-07
5093707 Semiconductor device with bipolar and CMOS transistors 1992-03-03
5091760 Semiconductor device Hiroshi Momose 1992-02-25
5091322 Semiconductor device and method of manufacturing the same Hiroshi Momose 1992-02-25
5075752 Bi-CMOS semiconductor device having memory cells formed in isolated wells Syuso Fujii 1991-12-24
5014106 Semiconductor device for use in a hybrid LSI circuit Masayoshi Higashizono 1991-05-07
4931407 Method for manufacturing integrated bipolar and MOS transistors Koji Makita 1990-06-05
4900257 Method of making a polycide gate using a titanium nitride capping layer 1990-02-13
4769337 Method of forming selective polysilicon wiring layer to source, drain and emitter regions by implantation through polysilicon layer 1988-09-06
4663825 Method of manufacturing semiconductor device 1987-05-12